Lithographic Apparatus
A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to p...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
20.06.2019
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Subjects | |
Online Access | Get full text |
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Summary: | A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure. |
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Bibliography: | Application Number: US201716326410 |