Patterning Device

A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength...

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Bibliographic Details
Main Authors BASELMANS, Johannes Jacobus Matheus, SLADKOV, Maksym Yuriiovych, BAUMER, Stefan Michael Bruno, FINDERS, Jozef Maria, SCHASFOORT, Gerard Frans Jozef, DIKKERS, Manfred Petrus Johannes Maria, VAN ZWOL, Pieter-Jan, ENGELEN, Wouter Joep, DE WINTER, Laurentius Cornelius, VAN DE KERKHOF, Marcus Adrianus, VOOGD, Robbert Jan, DE GROOT, Pieter Cristiaan
Format Patent
LanguageEnglish
Published 09.05.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
Bibliography:Application Number: US201716300370