METHODS FOR REMOVING HALOGENATED ETHYLENE IMPURITIES IN 2, 3, 3, 3-TETRAFLUOROPROPENE PRODUCT

Disclosed is a composition comprised of at least one compound selected from 2,3,3,3-tetrafluoropropene, 1,3,3,3-tetrafluoro-1-propene and 1-chloro-3,3,3-trifluoropropene and halogenated impurity selected from the group consisting of HFO-1141 (CH2═CHF), HCFO-1140 (CH2═CHCl), and HCFO-1131 (CH2═CFCl a...

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Bibliographic Details
Main Authors WANG, Haiyou, TUNG, Hsueh Sung
Format Patent
LanguageEnglish
Published 14.02.2019
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
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Summary:Disclosed is a composition comprised of at least one compound selected from 2,3,3,3-tetrafluoropropene, 1,3,3,3-tetrafluoro-1-propene and 1-chloro-3,3,3-trifluoropropene and halogenated impurity selected from the group consisting of HFO-1141 (CH2═CHF), HCFO-1140 (CH2═CHCl), and HCFO-1131 (CH2═CFCl and/or translcis-CHF═CHCl) and combination thereof, said halogenated impurity being present in said composition in an amount of 50 ppm or less.
Bibliography:Application Number: US201816158567