SYSTEM AND METHOD FOR DESIGN BASED INSPECTION
Design information related to an irrelevant area of a first layer of semiconductor article may be received. The first layer may be manufactured by illuminating a lithographic mask during a lithographic process. First layer information associated with an outcome or an expected outcome of the illumina...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
13.12.2018
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Subjects | |
Online Access | Get full text |
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Abstract | Design information related to an irrelevant area of a first layer of semiconductor article may be received. The first layer may be manufactured by illuminating a lithographic mask during a lithographic process. First layer information associated with an outcome or an expected outcome of the illuminating of the lithographic mask during the lithographic process may be received. Information corresponding to a layout of an irrelevant area may be identified in the first layer information. A differentiating attribute that differentiates the layout of the irrelevant area from a layout of a relevant area of the first layer of the semiconductor article may be identified. The differentiating attribute may be used to determine one or more other irrelevant areas of the first layer of the semiconductor article. |
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AbstractList | Design information related to an irrelevant area of a first layer of semiconductor article may be received. The first layer may be manufactured by illuminating a lithographic mask during a lithographic process. First layer information associated with an outcome or an expected outcome of the illuminating of the lithographic mask during the lithographic process may be received. Information corresponding to a layout of an irrelevant area may be identified in the first layer information. A differentiating attribute that differentiates the layout of the irrelevant area from a layout of a relevant area of the first layer of the semiconductor article may be identified. The differentiating attribute may be used to determine one or more other irrelevant areas of the first layer of the semiconductor article. |
Author | Parizat, Ziv Rosenweig, Moshe |
Author_xml | – fullname: Rosenweig, Moshe – fullname: Parizat, Ziv |
BookMark | eNrjYmDJy89L5WTQDY4MDnH1VXD0c1HwdQ3x8HdRcPMPUnBxDfZ091Nwcgx2dVHw9AsOcHUO8fT342FgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGFsam5kDkaGhMnCoAO4AoDQ |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | US2018357357A1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US2018357357A13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 15:36:54 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US2018357357A13 |
Notes | Application Number: US201816105430 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181213&DB=EPODOC&CC=US&NR=2018357357A1 |
ParticipantIDs | epo_espacenet_US2018357357A1 |
PublicationCentury | 2000 |
PublicationDate | 20181213 |
PublicationDateYYYYMMDD | 2018-12-13 |
PublicationDate_xml | – month: 12 year: 2018 text: 20181213 day: 13 |
PublicationDecade | 2010 |
PublicationYear | 2018 |
RelatedCompanies | Applied Materials Israel Ltd |
RelatedCompanies_xml | – name: Applied Materials Israel Ltd |
Score | 3.18502 |
Snippet | Design information related to an irrelevant area of a first layer of semiconductor article may be received. The first layer may be manufactured by illuminating... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
Title | SYSTEM AND METHOD FOR DESIGN BASED INSPECTION |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181213&DB=EPODOC&locale=&CC=US&NR=2018357357A1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_G_HzTqfgxJaD0rbit6eYehmxNahXaDdvJfBpNmoEg3bAV_30vodM9DfKSOzgugV_uLrm7ANylffTYslZqqwdBbSo7wk47Utjt_gKx50pJW7reOYy6wZS-zNxZDT7XtTCmT-iPaY6IiJKI99Kc16v_SyxmciuLe_GBpOWjnwyYVUXH2ly1HYuNBnwyZmPP8rzBNLaiV8Nz3B6OIcZKO9qR1p32-dtI16WsNo2KfwS7E5SXl8dQU3kDDrz132sN2A-rJ-8G7JkcTVkgscJhcQJ2_B4nPCTDiJGQJ8GYEYzmCOPx81NERsOYM4Jh-YSbFJFTuPV54gU2ajD_W_B8Gm-q65xBPV_m6hyIIxFfPdXNUtqimUtFJ1VZT_UdKlMlFvICmtskXW5nX8GhnupkjbbThHr59a2u0eSW4sbs1C8fnoAx |
link.rule.ids | 230,309,786,891,25594,76903 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8Q_MA3RY0fqE00e1uErWPyQAysxaFsEDcMPpG1K4mJGURm_Pe9NaA8kfTpLrlcm_x6_bV3V4C7pIUntrSemOpBUJNKS5iJJYXZaM0Qe46UtF7UOwdh0x_T54kzKcHnuhZG9wn90c0REVES8Z7r_Xrxf4nFdG7l8l58oGj-2IvbzFix4yJcNWyDddt8NGRDz_C89jgywletsx0XRwe50o6LpFCTpbduUZey2AwqvUPYHaG9LD-CksqqUPHWf69VYT9YPXlXYU_naMolClc4XB6DGb1HMQ9IJ2Qk4LE_ZATZHGE86j-FpNuJOCNIy0dcp4icwG2Px55vogfTvwlPx9Gmu_YplLN5ps6A2BLx5apmmtA6TR0qrESlrmrZVCZKzOQ51LZZutiuvoGKHweD6aAfvlzCQaEqEjcadg3K-de3usLwm4trvWq_QwiDGw |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=SYSTEM+AND+METHOD+FOR+DESIGN+BASED+INSPECTION&rft.inventor=Rosenweig%2C+Moshe&rft.inventor=Parizat%2C+Ziv&rft.date=2018-12-13&rft.externalDBID=A1&rft.externalDocID=US2018357357A1 |