REFRACTORY METAL ALLOY TARGETS FOR PHYSICAL VAPOR DEPOSITION
Refractory metal alloy targets for reducing particles in physical vapor deposition processing and refractory metal-based layer for integrated circuit applications (for example, crystallization barrier layers in non-volatile memory devices) are disclosed herein. An exemplary method for reducing parti...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
15.11.2018
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Subjects | |
Online Access | Get full text |
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