Interspinous Process Spacing Device

Interspinous process spacing devices and associated methods are provided. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, and a spacer. The first attachment side and the second attachment side each include a central portion, a fir...

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Bibliographic Details
Main Authors Yilma, Hiywot, Field, David C, Bohleber, Brandi L, Cowan, Michael A, Smisson, III, Hugh F
Format Patent
LanguageEnglish
Published 15.11.2018
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Summary:Interspinous process spacing devices and associated methods are provided. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, and a spacer. The first attachment side and the second attachment side each include a central portion, a first wing portion, and a second wing portion. The central portion includes an inner surface extending along at least a majority of an anterior-posterior height of the central portion, and the first wing portion includes an inner surface extending along at least a majority of an anterior-posterior height of the first wing portion. The inner surface of the first wing portion extends in a direction transverse to the inner surface of the central portion, and the anterior-posterior height of the first wing portion is less than the anterior-posterior height of the central portion.
Bibliography:Application Number: US201816036329