VERTICAL DIVISION OF THREE-DIMENSIONAL MEMORY DEVICE
A method of forming a vertical non-volatile (NV) memory device such as 3-D NAND flash memory includes forming a vertical NV memory cell string within an opening disposed in a stack of alternating layers of a first layer and a second layer over a substrate, and dividing the vertical NV memory cell st...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
08.11.2018
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Subjects | |
Online Access | Get full text |
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Summary: | A method of forming a vertical non-volatile (NV) memory device such as 3-D NAND flash memory includes forming a vertical NV memory cell string within an opening disposed in a stack of alternating layers of a first layer and a second layer over a substrate, and dividing the vertical NV memory cell string into two halves with a first vertical deep trench and an isolation dielectric pillar formed in the first vertical deep trench, such that memory bit density of the divided vertical NV memory cell strings double the memory bits of the device. |
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Bibliography: | Application Number: US201816020546 |