LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

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Bibliographic Details
Main Authors Maria Mertens, Jeroen Johannes Sophia, Riepen, Michel, STREEFKERK, Bob, Leenders, Martinus Hendrikus Antonius, Donders, Sjoerd Nicolaas Lambertud, De Graaf, Roelof Frederik, Hoogendam, Christiaan Alexander
Format Patent
LanguageEnglish
Published 08.11.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
Bibliography:Application Number: US201816034859