3D VERTICAL FET WITH TOP AND BOTTOM GATE CONTACTS
A method for forming a semiconductor device includes forming bottom side metallization structures having at least one connection to a bottom side of a vertical transistor disposed on a substrate, the bottom side metallization structures including a power rail and a ground rail. After forming the bot...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
25.10.2018
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Subjects | |
Online Access | Get full text |
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