3D VERTICAL FET WITH TOP AND BOTTOM GATE CONTACTS

A method for forming a semiconductor device includes forming bottom side metallization structures having at least one connection to a bottom side of a vertical transistor disposed on a substrate, the bottom side metallization structures including a power rail and a ground rail. After forming the bot...

Full description

Saved in:
Bibliographic Details
Main Authors Anderson, Brent A, Chu, Albert M
Format Patent
LanguageEnglish
Published 25.10.2018
Subjects
Online AccessGet full text

Cover

Loading…