3D VERTICAL FET WITH TOP AND BOTTOM GATE CONTACTS
A method for forming a semiconductor device includes forming bottom side metallization structures having at least one connection to a bottom side of a vertical transistor disposed on a substrate, the bottom side metallization structures including a power rail and a ground rail. After forming the bot...
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Format | Patent |
Language | English |
Published |
25.10.2018
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Online Access | Get full text |
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Abstract | A method for forming a semiconductor device includes forming bottom side metallization structures having at least one connection to a bottom side of a vertical transistor disposed on a substrate, the bottom side metallization structures including a power rail and a ground rail. After forming the bottom side metallization structures, the substrate is removed and the vertical transistor is flipped. Top side metallization structures are formed. The top side metallization structures having at least one connection to the vertical transistor on a top side of the vertical transistor. |
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AbstractList | A method for forming a semiconductor device includes forming bottom side metallization structures having at least one connection to a bottom side of a vertical transistor disposed on a substrate, the bottom side metallization structures including a power rail and a ground rail. After forming the bottom side metallization structures, the substrate is removed and the vertical transistor is flipped. Top side metallization structures are formed. The top side metallization structures having at least one connection to the vertical transistor on a top side of the vertical transistor. |
Author | Chu, Albert M Anderson, Brent A |
Author_xml | – fullname: Anderson, Brent A – fullname: Chu, Albert M |
BookMark | eNrjYmDJy89L5WQwNHZRCHMNCvF0dvRRcHMNUQj3DPFQCPEPUHD0c1Fw8g8J8fdVcHcMcVVw9vcLcXQOCeZhYE1LzClO5YXS3AzKQH3OHrqpBfnxqcUFicmpeakl8aHBRgaGFsYGFuZmRo6GxsSpAgC4Wyjb |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
ExternalDocumentID | US2018308762A1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US2018308762A13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 14:47:28 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US2018308762A13 |
Notes | Application Number: US201816023120 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181025&DB=EPODOC&CC=US&NR=2018308762A1 |
ParticipantIDs | epo_espacenet_US2018308762A1 |
PublicationCentury | 2000 |
PublicationDate | 20181025 |
PublicationDateYYYYMMDD | 2018-10-25 |
PublicationDate_xml | – month: 10 year: 2018 text: 20181025 day: 25 |
PublicationDecade | 2010 |
PublicationYear | 2018 |
RelatedCompanies | INTERNATIONAL BUSINESS MACHINES CORPORATION |
RelatedCompanies_xml | – name: INTERNATIONAL BUSINESS MACHINES CORPORATION |
Score | 3.1703691 |
Snippet | A method for forming a semiconductor device includes forming bottom side metallization structures having at least one connection to a bottom side of a vertical... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
Title | 3D VERTICAL FET WITH TOP AND BOTTOM GATE CONTACTS |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20181025&DB=EPODOC&locale=&CC=US&NR=2018308762A1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_GFPVNp-LHlIDSt-K2tmv7MKRNOqewtqzp3Nto0xYE6Yar-O97KZ3uaZCHfHH5gN9dLrm7ADzmtmYJUSSINBsVFMSbatmZpeZDWxepsApM0trCH05i_W1hLFrwufWFqeOE_tTBERFRAvFe1fx6_X-JxWrbys1T-oFVq-cxHzGl0Y5RXKEMV5g78sKABVShdBRHij-r22Twu-HAQV3pAA_SpsSDN3elX8p6V6iMT-EwRHpldQatvOzAMd3-vdaBo2nz5I3ZBn2bc-hrjMy9GZchDMjY4-T9lU8ID0Li-Iy4qJwHU_LicI_QwOcO5dEFPGA_OlFx7OXfUpdxtDtR7RLa5arMr4CkIsl6qTkQmp3rmZkkhqllmaHrhdUr-kVyDd19lG72N9_CiSxKnjwwutCuvr7zOxS2VXpf79EvsPd99Q |
link.rule.ids | 230,309,783,888,25576,76876 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_GFOebTsWPqQGlb8Ot330Y0qWdnW7t2NK5t9KmLQjSDVfx3_dSNt3TIA8hFy4f8LvLJXcXgMfMUkzO8xiRZqGBgnhrm1ZqtjPdUnnCzRyL8LbwdS9UXxfaogaf21iYKk_oT5UcERHFEe9lJa9X_5dYTuVbuX5KPrBp-TxgPUfaWMeorlCHS06_504CJ6ASpb1wJvnTiiaS3-myjbbSAR6yDYEHd94XcSmrXaUyOIHDCfIrylOoZUUTGnT791oTjsabJ2-sbtC3PoOu4pC5O2UihQEZuIy8D5lHWDAhtu-QPhrnwZi82MwlNPCZTdnsHB6wH_XaOHb0t9QonO1OVLmAerEssksgCY_TTmLIXLEyNTXiWDOUNNVUNTc7eTePr6C1j9P1fvI9NDw2HkWjof92A8eCJOSzrLWgXn59Z7eoeMvkrtqvX8R7gOg |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=3D+VERTICAL+FET+WITH+TOP+AND+BOTTOM+GATE+CONTACTS&rft.inventor=Anderson%2C+Brent+A&rft.inventor=Chu%2C+Albert+M&rft.date=2018-10-25&rft.externalDBID=A1&rft.externalDocID=US2018308762A1 |