METHOD AND APPARATUS FOR BACKSIDE CLEANING OF SUBSTRATES

Embodiments of methods and apparatus for removing particles from a surface of a substrate, such as from the backside of the substrate, are provided herein. In some embodiments, an apparatus for removing particles from a surface of a substrate includes: a substrate handler to expose the surface of th...

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Bibliographic Details
Main Authors LEW, JEN SERN, SUNDARRAJAN, ARVIND, THIRUNAVUKARASU, SRISKANTHARAJAH, NEMANI, SRINIVAS
Format Patent
LanguageEnglish
Published 13.09.2018
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Summary:Embodiments of methods and apparatus for removing particles from a surface of a substrate, such as from the backside of the substrate, are provided herein. In some embodiments, an apparatus for removing particles from a surface of a substrate includes: a substrate handler to expose the surface of the substrate; a particle separator to separate particles from the exposed surface of the substrate; a particle transporter to transport the separated particles; and a particle collector to collect the transported particles.
Bibliography:Application Number: US201815974000