LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the...

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Main Authors Teunissen, Franciscus Johannes Herman Maria, Baselmans, Johannes Jacobus Matheus, Van Santen, Helmar, Kolesnychenko, Aleksey Yurievich, Mertens, Jeroen Johannes Sophia Maria, Hoogendam, Christiaan Alexander, Mulkens, Johannes Catharinus Hubertus, Streefkerk, Bob, Jansen, Hans, Donders, Sjoerd Nicolaas Lambertus, Peeters, Felix Godfried Peter
Format Patent
LanguageEnglish
Published 30.08.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Bibliography:Application Number: US201815969847