METHOD FOR PRODUCING SEVOFLURANE

An object of the present invention is to remove a compound A from "sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)" so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially n...

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Bibliographic Details
Main Authors YOSHIMURA, Takaaki, AKIBA, Shinya, FUJIWARA, Masaki, OONO, Toshihiko
Format Patent
LanguageEnglish
Published 09.08.2018
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
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Summary:An object of the present invention is to remove a compound A from "sevoflurane containing fluoromethyl-1,1,3,3,3-pentafluoroisopropenyl ether (compound A)" so as to collect high-purity sevoflurane. The present invention concerns a method for producing sevoflurane containing substantially no compound A, comprising the following steps of: bringing a composition containing hydrogen fluoride (HF) and water at a mass ratio of 1:1 to 1:30 into contact with a 1st organic liquid containing sevoflurane and a compound A, thereby obtaining a 2nd organic liquid containing the compound A in an amount that is lower than that in the 1st organic liquid (step 1a); and distilling the 2nd organic liquid under the presence of a degradation inhibitor, thereby obtaining sevoflurane containing substantially no compound A as a main distillation fraction (step 2).
Bibliography:Application Number: US201715473940