Integrated Circuit Structure with Guard Ring

A semiconductor structure includes a substrate having a first region and a second region being adjacent each other; a first patterned layer formed on the substrate, wherein the first patterned layer includes first features in the first region, wherein the second region is free of the patterned layer...

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Bibliographic Details
Main Authors Shiu, Feng-Jia, Wu, Chun-Chang, Cheng, Chihy-Yuan, Kuo, Ching-Sen, Chen, Chun-Chang, Yang, Shun-Shing
Format Patent
LanguageEnglish
Published 19.07.2018
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A semiconductor structure includes a substrate having a first region and a second region being adjacent each other; a first patterned layer formed on the substrate, wherein the first patterned layer includes first features in the first region, wherein the second region is free of the patterned layer; and a first guard ring disposed in the second region and surrounding the first features, wherein the first guard ring includes a first width W1 and is spaced a first distance D1 from the first features, W1 being greater than D1.
Bibliography:Application Number: US201815918623