GENERATION OF A MAP OF A SUBSTRATE USING ITERATIVE CALCULATIONS OF NON-MEASURED ATTRIBUTE DATA

Described herein are technologies to facilitate the generation and presentation of a map of an attribute of a substrate, such as a semiconductor wafer. Using the data of measured attribute (e.g., thickness, temperature, etc.) of a substrate, one or more of the described implementations generate data...

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Bibliographic Details
Main Authors Morvay, Daniel, Han, Taejoon
Format Patent
LanguageEnglish
Published 24.05.2018
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:Described herein are technologies to facilitate the generation and presentation of a map of an attribute of a substrate, such as a semiconductor wafer. Using the data of measured attribute (e.g., thickness, temperature, etc.) of a substrate, one or more of the described implementations generate data of non-measured (i.e., calculated) attributes to complete a map of the substrate using model parameters and a correlations model, such as a squared exponential Gaussian process model.
Bibliography:Application Number: US201715484436