HARD SURFACE CLEANING COMPOSITION AND METHOD OF IMPROVING DRYING TIME USING THE SAME
A hard surface cleaning composition and a method of cleaning a hard surface with a low drying time composition is provided. The hard surface cleaning composition comprises: 0.02 wt. % to 0.07 wt. % amine oxide; 0.15 wt. % to 1.50 wt. % of a glycol ether having an HLB between 6.5 and 7.0; 0.10 wt. %...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
03.05.2018
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Subjects | |
Online Access | Get full text |
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Summary: | A hard surface cleaning composition and a method of cleaning a hard surface with a low drying time composition is provided. The hard surface cleaning composition comprises: 0.02 wt. % to 0.07 wt. % amine oxide; 0.15 wt. % to 1.50 wt. % of a glycol ether having an HLB between 6.5 and 7.0; 0.10 wt. % to 0.50 wt. % of a glycol ether having an HLB between 6.0 and 6.5; and at least 97 wt. % water, by weight of the overall composition. |
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Bibliography: | Application Number: US201615342207 |