COMPOSITION ANALYSIS METHOD AND COMPOSITION ANALYSIS SYSTEM

A composition analysis method includes iteratively irradiating a sample with an ion beam, irradiating a specific portion of the sample that is thinned by the irradiation of the ion beam with an electron beam, and detecting an intensity of an X-ray generated from the sample by the irradiation of the...

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Bibliographic Details
Main Author TAKENO Shiro
Format Patent
LanguageEnglish
Published 22.03.2018
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:A composition analysis method includes iteratively irradiating a sample with an ion beam, irradiating a specific portion of the sample that is thinned by the irradiation of the ion beam with an electron beam, and detecting an intensity of an X-ray generated from the sample by the irradiation of the electron beam. The method further includes determining an identity of an element included in the sample based on at least one detection result obtained in the iterative process.
Bibliography:Application Number: US201715449671