MULTIPLE WAFER SINGLE BATH ETCHER
An etcher comprises a bath, a plurality of blades, and a tunnel. The bath includes a first electrode at a first end and a second electrode at a second end. The plurality of blades is configured to fit in the bath. At least one blade of the plurality of blades holds a wafer. At least one tunnel is co...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
04.01.2018
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Subjects | |
Online Access | Get full text |
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Summary: | An etcher comprises a bath, a plurality of blades, and a tunnel. The bath includes a first electrode at a first end and a second electrode at a second end. The plurality of blades is configured to fit in the bath. At least one blade of the plurality of blades holds a wafer. At least one tunnel is configured to fit between adjacent blades of the plurality of blades in the bath. |
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Bibliography: | Application Number: US201715707688 |