METHOD AND RECORDING MEDIUM OF REDUCING CHEMOEPITAXY DIRECTED SELF-ASSEMBLED DEFECTS

• Main Authors: Liu Chi-Chun, Tsai Hsinyu, Raghunathan Ananthan, Lai Kafai, Guillorn Michael A
• Format: Patent
• Language: English
• Published: 28.12.2017
• Subjects: BASIC ELECTRIC ELEMENTS; CALCULATING; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PHYSICS; SEMICONDUCTOR DEVICES

A method, system, and non-transitory computer readable medium for reducing chemo-epitaxy directed-self assembly (DSA) defects of a guiding pattern layout, include inserting an internal dummy between a first portion of the guiding pattern and a second portion of the guiding pattern if a vertical spac...