METHOD AND RECORDING MEDIUM OF REDUCING CHEMOEPITAXY DIRECTED SELF-ASSEMBLED DEFECTS
A method, system, and non-transitory computer readable medium for reducing chemo-epitaxy directed-self assembly (DSA) defects of a guiding pattern layout, include inserting an internal dummy between a first portion of the guiding pattern and a second portion of the guiding pattern if a vertical spac...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
28.12.2017
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Subjects | |
Online Access | Get full text |
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Summary: | A method, system, and non-transitory computer readable medium for reducing chemo-epitaxy directed-self assembly (DSA) defects of a guiding pattern layout, include inserting an internal dummy between a first portion of the guiding pattern and a second portion of the guiding pattern if a vertical spacing is equal to or greater than a first predetermined distance, inserting a first external dummy along an external edge of the guiding pattern in a vertical direction if the vertical spacing is greater than a second predetermined distance, and inserting an anti-taper structure on the first external dummy if a second distance from the external edge of the guiding pattern to the edge of the first external dummy is greater than a first distance. |
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Bibliography: | Application Number: US201715697594 |