Compound Semiconductor Substrate and Method of Forming a Compound Semiconductor Substrate

• Main Authors: Chowdhury Uttiya, Lavanga Simone
• Format: Patent
• Language: English
• Published: 21.12.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method of forming a compound semiconductor substrate includes providing a crystalline base substrate having a first semiconductor material and a main surface, and forming a first semiconductor layer on the main surface and having a pair of tracks disposed on either side of active device regions. The first semiconductor layer is formed from a second semiconductor material having a different coefficient of thermal expansion than the first semiconductor material. The pair of tracks have a relatively weaker crystalline structure than the active device regions. The method further includes thermally cycling the base substrate and the first semiconductor layer such that the first semiconductor layer expands and contracts at a different rate than the base substrate. The pair of tracks physically decouple adjacent ones of the active device regions during the thermal cycling.