SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
According to one embodiment, a first semiconductor body extends in a stacking direction of a stacked body through a first stacked unit and contacts a foundation layer. A plurality of contact vias extend in the stacking direction through an insulating layer and contact a plurality of terrace portions...
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | English |
Published |
17.08.2017
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | According to one embodiment, a first semiconductor body extends in a stacking direction of a stacked body through a first stacked unit and contacts a foundation layer. A plurality of contact vias extend in the stacking direction through an insulating layer and contact a plurality of terrace portions. A second semiconductor body extends in the stacking direction through a second stacked unit. An insulating film is provided between the foundation layer and a lower end portion of the second semiconductor body. |
---|---|
Bibliography: | Application Number: US201615207847 |