METHOD FOR SUPPLYING GAS FOR PLASMA BASED ANALYTICAL INSTRUMENT

To achieve an effective gas filtering in a plasma spectrometric apparatus using a gas of a comparatively high consumption flow rate, and to improve the analytical ability, there is provided a plasma spectrometric apparatus containing a sample introducer for producing and delivering an injector gas c...

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Bibliographic Details
Main Authors Tsuruga Shusaku, Kuwabara Takeo, Tobiyama Ryosuke, Nagata Yoichi
Format Patent
LanguageEnglish
Published 03.08.2017
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:To achieve an effective gas filtering in a plasma spectrometric apparatus using a gas of a comparatively high consumption flow rate, and to improve the analytical ability, there is provided a plasma spectrometric apparatus containing a sample introducer for producing and delivering an injector gas containing an analyte sample, a plasma generator for generating plasma into which the injector gas is introduced, and an analyzer disposed subsequent to the plasma generator for analyzing the analyte sample. The plasma spectrometric apparatus contains a first gas line for supplying gas to the sample introducer, a second gas line for supplying gas to the plasma generator, and a filter located in the first gas line for removing impurities contained in the gas.
Bibliography:Application Number: US201715418039