METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE HAVING MOISTURE-RESISTANT RINGS BEING FORMED IN A PERIPHERAL REGION
A semiconductor device includes a first moisture-resistant ring disposed in a peripheral region surrounding a circuit region on a semiconductor substrate in such a way as to surround the circuit region and a second moisture-resistant ring disposed in the peripheral region in such a way as to surroun...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
29.06.2017
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A semiconductor device includes a first moisture-resistant ring disposed in a peripheral region surrounding a circuit region on a semiconductor substrate in such a way as to surround the circuit region and a second moisture-resistant ring disposed in the peripheral region in such a way as to surround the first moisture-resistant ring. |
---|---|
Bibliography: | Application Number: US201715459199 |