SUBSTRATE CLEANING APPARATUS AND METHOD FOR CLEANING SUBSTRATE FOR SUBSTRATE RELATED TO PHOTOMASK
The present invention provides a substrate cleaning apparatus for a substrate related to a photomask, including a holder for holding only an end face of the substrate, a rotation mechanism for rotating the holder, and a nozzle for supplying liquid at least to the front surface of the substrate rotat...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
20.04.2017
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention provides a substrate cleaning apparatus for a substrate related to a photomask, including a holder for holding only an end face of the substrate, a rotation mechanism for rotating the holder, and a nozzle for supplying liquid at least to the front surface of the substrate rotating with the holder by the rotation mechanism; wherein at least one of the holder has a conductive surface and is earthed. The present invention also provides a method for cleaning a substrate related to a photomask. These inventions can prevent adhesion of contaminants to the substrate when performing a cleaning treatment. |
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Bibliography: | Application Number: US201615283896 |