SUBSTRATE CLEANING APPARATUS AND METHOD FOR CLEANING SUBSTRATE FOR SUBSTRATE RELATED TO PHOTOMASK

The present invention provides a substrate cleaning apparatus for a substrate related to a photomask, including a holder for holding only an end face of the substrate, a rotation mechanism for rotating the holder, and a nozzle for supplying liquid at least to the front surface of the substrate rotat...

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Bibliographic Details
Main Authors SAKURADA Toyohisa, NUMANAMI Tsuneo, INAZUKI Yukio
Format Patent
LanguageEnglish
Published 20.04.2017
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The present invention provides a substrate cleaning apparatus for a substrate related to a photomask, including a holder for holding only an end face of the substrate, a rotation mechanism for rotating the holder, and a nozzle for supplying liquid at least to the front surface of the substrate rotating with the holder by the rotation mechanism; wherein at least one of the holder has a conductive surface and is earthed. The present invention also provides a method for cleaning a substrate related to a photomask. These inventions can prevent adhesion of contaminants to the substrate when performing a cleaning treatment.
Bibliography:Application Number: US201615283896