FORMING SACRIFICIAL STRUCTURES USING PHASE-CHANGE MATERIALS THAT SUBLIMATE

A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.

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Bibliographic Details
Main Authors Ng Tse Nga, Ready Steven E, Hsieh Bing R
Format Patent
LanguageEnglish
Published 20.04.2017
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Summary:A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.
Bibliography:Application Number: US201615391723