PURGE AND PUMPING STRUCTURES ARRANGED BENEATH SUBSTRATE PLANE TO REDUCE DEFECTS
A substrate processing system includes a processing chamber including a top surface, a bottom surface and side walls. A substrate support is arranged in the processing chamber to support a substrate during processing. A purge structure is arranged in the processing chamber below a plane occupied by...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
06.04.2017
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Subjects | |
Online Access | Get full text |
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Summary: | A substrate processing system includes a processing chamber including a top surface, a bottom surface and side walls. A substrate support is arranged in the processing chamber to support a substrate during processing. A purge structure is arranged in the processing chamber below a plane occupied by the substrate during processing. The purge structure includes a first plurality of holes configured to supply purge gas to purge an area between the substrate support and the bottom surface of the processing chamber. |
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Bibliography: | Application Number: US201514872513 |