METHOD FOR MANUFACTURING SILICA LAYER, SILICA LAYER, AND ELECTRONIC DEVICE

A method of manufacturing a silica layer includes: coating a pre-wetting liquid material including a carbon compound on a substrate; coating a composition for forming a silica layer on the substrate coated with the pre-wetting liquid material; and curing a substrate coated with the composition for f...

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Bibliographic Details
Main Authors YUN Huichan, BAE Jin-Hee, LEE Jiho, NOH Kunbae, LIM Wanhee
Format Patent
LanguageEnglish
Published 30.03.2017
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A method of manufacturing a silica layer includes: coating a pre-wetting liquid material including a carbon compound on a substrate; coating a composition for forming a silica layer on the substrate coated with the pre-wetting liquid material; and curing a substrate coated with the composition for forming a silica layer.
Bibliography:Application Number: US201615178378