METHOD FOR FORMING PATTERNS AND METHOD FOR MANUFACTURING MAGNETIC MEMORY DEVICE USING THE SAME

A method for forming a pattern, the method including forming an etch target layer on a substrate; patterning the etch target layer to form patterns; and performing a pre-oxidation trim process a plurality of times, the pre-oxidation trim process including performing an oxidation process to form an i...

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Bibliographic Details
Main Authors KIM Sang-Kuk, KIM Inho, PARK Jongchul, BAEK Gwang-Hyun, OH Jung-Ik, KIM Jong-Kyu
Format Patent
LanguageEnglish
Published 02.03.2017
Subjects
ELECTRICITY
INFORMATION STORAGE
PHYSICS
STATIC STORES
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Summary:A method for forming a pattern, the method including forming an etch target layer on a substrate; patterning the etch target layer to form patterns; and performing a pre-oxidation trim process a plurality of times, the pre-oxidation trim process including performing an oxidation process to form an insulating layer on a sidewall of each of the patterns; and performing a sputter etch process to remove at least a portion of the insulating layer.
Bibliography:Application Number: US201615180843