METHOD OF MAKING COMPOSITE POLISHING LAYER FOR CHEMICAL MECHANICAL POLISHING PAD
A method of forming a chemical mechanical polishing pad composite polishing layer is provided, including: providing a first polishing layer component of a first continuous non-fugitive polymeric phase having a plurality of periodic recesses; discharging a combination toward the first polishing layer...
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Main Authors | , , , , , , , , , , , |
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Format | Patent |
Language | English |
Published |
29.12.2016
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Subjects | |
Online Access | Get full text |
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