TRENCH GATE POWER SEMICONDUCTOR FIELD EFFECT TRANSISTOR

Provided in the present invention is a trench gate power MOSFET (TMOS/UMOS) structure with a heavily doped polysilicon source region. The polysilicon source region is formed by deposition, and a trench-shaped contact hole is used at the source region, in order to attain low contact resistance and sm...

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Bibliographic Details
Main Authors SIN Johnny Kin On, ZHOU Xianda, FUNG Shuk-Wa
Format Patent
LanguageEnglish
Published 22.12.2016
Subjects
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