CLEANSING COMPOSITION CONTAINING OLIGODYNAMIC METAL AND EFFICACY ENHANCING AGENT

In one aspect is disclosed a cleansing composition comprising: (i) a surfactant; (ii) an oligodynamic metal or ions thereof; (iii) a chelating agent; and, a polymer having a group comprising a site having one or more lone pair of electrons wherein, said surfactant is soap. The polymer having a group...

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Bibliographic Details
Main Authors PARUCHURI Divya, KUMAR Nitish, AGARKHED Ajit Manohar
Format Patent
LanguageEnglish
Published 15.12.2016
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Summary:In one aspect is disclosed a cleansing composition comprising: (i) a surfactant; (ii) an oligodynamic metal or ions thereof; (iii) a chelating agent; and, a polymer having a group comprising a site having one or more lone pair of electrons wherein, said surfactant is soap. The polymer having a group comprising a site having one or more lone pair of electrons enhances the antimicrobial efficacy of the oligodynamic metal.
Bibliography:Application Number: US201515114102