INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE

A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does n...

Full description

Saved in:
Bibliographic Details
Main Authors ENGBLOM Peter David, HINNEN Paul Christiaan, BHATTACHARYYA Kaustuve, KESSELS Lambertus Gerardus Maria, VAN DOMMELEN Youri Johannes Laurentius Maria, PIETERS Marco Johannes Annemarie, DEN BOEF Arie Jeffrey
Format Patent
LanguageEnglish
Published 27.10.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
Bibliography:Application Number: US201415104212