SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME

A semiconductor device includes a plurality of wiring structures spaced apart from each other, and an insulating interlayer structure. Each of the wiring structures includes a metal pattern and a barrier pattern covering a sidewall, a bottom surface, and an edge portion of a top surface of the metal...

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Main Authors BAEK Jong-Min, AHN Sang-Hoon, PARK Young-Ju, KIM Byung-Hee, YOU Woo-Kyung, CHUNG Kyung-Min, LEE Nae-in
Format Patent
LanguageEnglish
Published 20.10.2016
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Summary:A semiconductor device includes a plurality of wiring structures spaced apart from each other, and an insulating interlayer structure. Each of the wiring structures includes a metal pattern and a barrier pattern covering a sidewall, a bottom surface, and an edge portion of a top surface of the metal pattern and not covering a central portion of the top surface of the metal pattern. The insulating interlayer structure contains the wiring structures therein, and has an air gap between the wiring structures.
Bibliography:Application Number: US201615006265