METHOD FOR FABRICATING PATTERN USING SUPPORTING ASSEMBLY WITH ROLLING MEMBER DISPOSED BELOW SUPPORTING RODS AND SEMICONDUCTOR FABRICATION APPARATUS HAVING THE SUPPORTING ASSEMBLY
A method for fabricating a pattern on a semiconductor substrate, comprising the steps of: (a) providing the semiconductor substrate having a photosensitive layer thereon; (b) transmitting the semiconductor substrate to an exposure apparatus including several tubes; (c) providing the supporting assem...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
13.10.2016
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Subjects | |
Online Access | Get full text |
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Summary: | A method for fabricating a pattern on a semiconductor substrate, comprising the steps of: (a) providing the semiconductor substrate having a photosensitive layer thereon; (b) transmitting the semiconductor substrate to an exposure apparatus including several tubes; (c) providing the supporting assembly to support the tubes, where the supporting assembly includes a first supporting rod having several first parallel recesses, a second supporting rod disposed opposite to the first supporting rod, a bridging member connected to one end of the first supporting rod or one end of the second supporting rod; and a rolling member received by the bridging member; (d) providing a photomask to the exposure apparatus; and (e) transferring the pattern from the photomask to the photosensitive layer. |
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Bibliography: | Application Number: US201615190165 |