LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Authors: DONDERS Sjoerd Nicolaas Lambertus, SENGERS Timotheus Franciscus, BUTLER Hans, LOF Joeri, DE SMIT Joannes Theodoor, KOLESNYCHENKO Aleksey Yurievich, VAN SANTEN Helmar, MULKENS Johannes Catharinus Hubertu, STRAAIJER Alexander, LOOPSTRA Erik Roelof, SIMON Klaus, MElJER Hendricus Johannes Maria, VAN SCHAIK Frank, MERTENS Jeroen Johannes Sophia Maria, RITSEMA Roelof Aeilko Siebrand
• Format: Patent
• Language: English
• Published: 29.09.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.