LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the pat...

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Bibliographic Details
Main Authors Maria Derksen Antonius Theodorus Anna, Lof Joeri, Streefkerk Bob, Jansen Hans, Straaijer Alexander, Loopstra Erik Roelof, HOOGENDAM Christiaan Alexander, Mulkens Johannes Catharinus Hubertus, Donders Sjoerd Nicolaas Lambertus, Verspay Jacobus Johannus Leonardus Hendricus
Format Patent
LanguageEnglish
Published 22.09.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Bibliography:Application Number: US201615167357