MEASURING ARRANGEMENT FOR MEASURING OPTICAL PROPERTIES OF A REFLECTIVE OPTICAL ELEMENT, IN PARTICULAR FOR MICROLITHOGRAPHY

• Main Authors: BOL Johannes, ROSTALSKI Hans-Juergen
• Format: Patent
• Language: English
• Published: 22.09.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

A measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithography, with an EUV light source (5), a detector (20) configured to detect EUV radiation reflected at the reflective optical element (10), and an imaging system (30, 40, 50, 60, 70,...