Reflective Photomask, Method for Inspecting Same and Mask Blank

According to an embodiment, a reflective photomask includes a substrate, a first layer on the substrate and a second layer on the first layer. The first layer is capable of receiving a first light, and emitting electrons. The second layer has an opening of a predetermined pattern, and is capable of...

Full description

Saved in:
Bibliographic Details
Main Authors NAKA Masato, TAKAI Kosuke
Format Patent
LanguageEnglish
Published 15.09.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
Online AccessGet full text

Cover

More Information
Summary:According to an embodiment, a reflective photomask includes a substrate, a first layer on the substrate and a second layer on the first layer. The first layer is capable of receiving a first light, and emitting electrons. The second layer has an opening of a predetermined pattern, and is capable of reflecting a second light.
Bibliography:Application Number: US201514842318