BARRIER ANODIZATION METHODS TO DEVELOP ALUMINUM OXIDE LAYER FOR PLASMA EQUIPMENT COMPONENTS
The disclosure relates to a chamber component or a method for fabricating a chamber component for use in a plasma processing chamber apparatus. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes an aluminum body having an anodized coating disposed on the alumi...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
08.09.2016
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Subjects | |
Online Access | Get full text |
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Summary: | The disclosure relates to a chamber component or a method for fabricating a chamber component for use in a plasma processing chamber apparatus. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes an aluminum body having an anodized coating disposed on the aluminum body formed from a neutral electrolyte solution, wherein the anodized coating has a film density higher than 3.1 g/cm−2. |
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Bibliography: | Application Number: US201514705659 |