DEVICES FOR TRAPPING AND CONTROLLING MICROPARTICLES WITH RADIATION

A particle manipulation device includes a substrate and a microchannel included in the substrate and configured to receive a fluid including particles therein. A biasing structure is formed on the substrate adjacent to, but outside the microchannel. The biasing structure is configured to dispense ra...

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Bibliographic Details
Main Author Tirapu Azpiroz Jaione
Format Patent
LanguageEnglish
Published 11.08.2016
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Summary:A particle manipulation device includes a substrate and a microchannel included in the substrate and configured to receive a fluid including particles therein. A biasing structure is formed on the substrate adjacent to, but outside the microchannel. The biasing structure is configured to dispense radiation at a frequency to bias movement of the particles within the microchannel from outside the microchannel.
Bibliography:Application Number: US201514615169