BRUSHLESS ROTARY PLASMA ELECTRODE STRUCTURE AND FILM COATING SYSTEM

A brushless rotary plasma electrode structure is disclosed. The brushless rotary plasma electrode structure includes a main body, a plurality of guided portions, and a plurality of conducting-through members. The main body further includes a plurality of electrode portions that have a first salient...

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Bibliographic Details
Main Authors LIN KUANG-YU, LIN SHIHIN, CHANG CHIA-HAO
Format Patent
LanguageEnglish
Published 21.07.2016
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Summary:A brushless rotary plasma electrode structure is disclosed. The brushless rotary plasma electrode structure includes a main body, a plurality of guided portions, and a plurality of conducting-through members. The main body further includes a plurality of electrode portions that have a first salient portion furnished at the periphery thereof. The guided portion is penetrated through the electrode portion. Each of the conducting-through members further includes a second salient portion. There is an internal in both the first salient portion and the second salient portion. In addition, a film coating system is also provided.
Bibliography:Application Number: US201514842316