METHOD AND APPARATUS FOR AN INTEGRATED CAPACITOR

An integrated capacitor can be fabricated with both electrodes formed by trenches for low resistance. According to one embodiment, the capacitor can comprise a first trench electrode, one or more dielectric layers, and a second trench electrode. The first trench electrode and the second trench elect...

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Main Authors WU RONGXIANG, SIN KIN ON JOHNNY, FANG XIANGMING
Format Patent
LanguageEnglish
Published 14.07.2016
Subjects
ELECTRICITY
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Abstract An integrated capacitor can be fabricated with both electrodes formed by trenches for low resistance. According to one embodiment, the capacitor can comprise a first trench electrode, one or more dielectric layers, and a second trench electrode. The first trench electrode and the second trench electrode can be fabricated in different trenches to improve capacitance density and resistance of the integrated capacitor.
AbstractList An integrated capacitor can be fabricated with both electrodes formed by trenches for low resistance. According to one embodiment, the capacitor can comprise a first trench electrode, one or more dielectric layers, and a second trench electrode. The first trench electrode and the second trench electrode can be fabricated in different trenches to improve capacitance density and resistance of the integrated capacitor.
Author SIN KIN ON JOHNNY
WU RONGXIANG
FANG XIANGMING
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Snippet An integrated capacitor can be fabricated with both electrodes formed by trenches for low resistance. According to one embodiment, the capacitor can comprise a...
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Title METHOD AND APPARATUS FOR AN INTEGRATED CAPACITOR
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