METHOD AND APPARATUS FOR AN INTEGRATED CAPACITOR

An integrated capacitor can be fabricated with both electrodes formed by trenches for low resistance. According to one embodiment, the capacitor can comprise a first trench electrode, one or more dielectric layers, and a second trench electrode. The first trench electrode and the second trench elect...

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Bibliographic Details
Main Authors WU RONGXIANG, SIN KIN ON JOHNNY, FANG XIANGMING
Format Patent
LanguageEnglish
Published 14.07.2016
Subjects
ELECTRICITY
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Summary:An integrated capacitor can be fabricated with both electrodes formed by trenches for low resistance. According to one embodiment, the capacitor can comprise a first trench electrode, one or more dielectric layers, and a second trench electrode. The first trench electrode and the second trench electrode can be fabricated in different trenches to improve capacitance density and resistance of the integrated capacitor.
Bibliography:Application Number: US201614991078