SYSTEMS AND METHODS FOR MANUFACTURING DIAMOND COATED WIRES

A method for designing a diamond coated wire for use in a wafer slicing system includes adjusting an initial diamond size distribution until an intermediate diamond size distribution is generated, wherein the intermediate diamond size distribution has a corresponding simulated penetration thickness...

Full description

Saved in:
Bibliographic Details
Main Authors REZVANIAN OMID, NANDAN RITURAJ, WITTE DALE A, CALVIN EDWARD, SHIVE LARRY WAYNE
Format Patent
LanguageEnglish
Published 30.06.2016
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A method for designing a diamond coated wire for use in a wafer slicing system includes adjusting an initial diamond size distribution until an intermediate diamond size distribution is generated, wherein the intermediate diamond size distribution has a corresponding simulated penetration thickness value less than or equal a predetermined penetration thickness value, and wherein penetration thickness is a parameter proportional to a depth of subsurface damage that would occur when slicing an ingot using a diamond coated wire having an associated diamond size distribution. The method may include adjusting the intermediate diamond size distribution until a final diamond size distribution is generated, wherein the final diamond size distribution has a maximum diamond grit size that is substantially equal to a predetermined maximum diamond grit size, and manufacturing the diamond coated wire such that the diamond coated wire has a plurality of diamond grits that fit the final diamond size distribution.
Bibliography:Application Number: US201514983954