Apparatus and Method of Sensing Liquid Leakage for Lithography Apparatus

Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage...

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Bibliographic Details
Main Authors KIM SUNG-JOO, KIM JIN-PYOUNG, SEO DO-HYUN, LEE HYUN-HOON, HWANG SUNG-JO, LEE JAE-PIL
Format Patent
LanguageEnglish
Published 02.06.2016
Subjects
MEASURING
PHYSICS
TESTING
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES
TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Summary:Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.
Bibliography:Application Number: US201514801113