BACK-ILLUMINATED INTEGRATED IMAGING DEVICE WITH SIMPLIFIED INTERCONNECT ROUTING

A back-illuminated integrated imaging device is formed from a semiconductor substrate including a zone of pixels bounded by capacitive deep trench isolations. A peripheral zone is located outside the zone of pixels. A continuous electrically conductive layer forms, in the zone of pixels, an electrod...

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Bibliographic Details
Main Authors ODDOU JEAN-PIERRE, GROS-JEAN MICKAEL, ALLEGRET-MARET STEPHANE, GUYADER FRANCOIS
Format Patent
LanguageEnglish
Published 07.04.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A back-illuminated integrated imaging device is formed from a semiconductor substrate including a zone of pixels bounded by capacitive deep trench isolations. A peripheral zone is located outside the zone of pixels. A continuous electrically conductive layer forms, in the zone of pixels, an electrode in a trench for each capacitive deep trench isolation, and forms, in the peripheral zone, a redistribution layer for electrically coupling the electrode to a biasing contact pad. The electrode is located in the trench between a trench dielectric and at least one material for filling the trench.
Bibliography:Application Number: US201514847391