LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

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Bibliographic Details
Main Authors VAN DER NET ANTONIUS JOHANNUS, REUHMAN-HUISKEN MARIA ELISABETH, WILHELMUS JACOBS JOHANNES HENRICUS, JOHANNES VERMEER ASCHWIN LODEWIJK HENDRICUS, HENDRICUS VERSPA Y JACOBUS JOHANNUS LEONARDUS, MOERMAN RICHARD, STAVENGA MARCO KOERT, SCHOONDERMARK BART LEONARD PETER, MENCHTCHIKOV BORIS, TEN KATE NICOLAAS, OTTENS JOOST JEROEN, DE JONG FREDERIK EDUARD, NIHTIANOV STOYAN, DE MOL CHRISTIANUS GERARDUS MARIA, QUAEDACKERS JOHANNES ANNA, CADEE THEODORUS PETRUS MARIA, JANSSEN FRANCISCUS JOHANNES JOSEPH, VERHAGEN MARTINUS CORNELIS MARIA, BOOM HERMAN, GOORMAN KOEN, LOOPSTRA ERIK ROELOF, MARIA MERTENS JEROEN JOHANNES SOPHIA, RIEPEN MICHEL, HUBERTUS MUITJENS MARCEL JOHANNUS ELISABETH, SMEETS MARTIN FRANS PIERRE, TINNEMANS PATRICIUS ALOYSIUS JACOBUS
Format Patent
LanguageEnglish
Published 18.02.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
Bibliography:Application Number: US201514882241