Coating and Method for its Deposition to Operate in Boundary Lubrication Conditions and at Elevated Temperatures

• Main Authors: TIETEMA ROEL, DOERWALD DAVE, HOVSEPIAN PAPKEN E
• Format: Patent
• Language: English
• Published: 31.12.2015
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; FUELS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LUBRICANTS; LUBRICATING COMPOSITIONS; METALLURGY; PEAT; PETROLEUM, GAS OR COKE INDUSTRIES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNICAL GASES CONTAINING CARBON MONOXIDE; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION

A metal doped carbon coating wherein the Me-doped C coating is for operation in boundary lubrication conditions, in which the metal is present in the coating in an amount of from 5 to 20% by atomic percent, i.e. the ratio of the number of atoms of the metal Me to the number of atoms of the carbon C does not exceed 1:4. The coating is made by pre-treating a workpiece surface by simultaneous bombardment of the surface with accelerated ions of W, Mo and C ions generated by a HIPIMS discharge in a treatment chamber. This is followed by deposition of a transition layer of metal and/or metal nitride of a thickness in the range from 20 nm-1000 nm thick by magnetron sputtering optionally in the form of or including HIPIMS sputtering, the metal being at least one of W and Mo. Thereafter a main layer the main layer of Me-doped C coating is deposited by HIPIMS sputtering.