LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

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Bibliographic Details
Main Authors STRAAIJER ALEXANDER, MODDERMAN THEODORUS MARINUS, RITSEMA ROELOF AEILKO SIEBRAND, VAN SANTEN HELMAR, HOOGENDAM CHRISTIAAN ALEXANDER, MULKENS JOHANNES CATHARINUS HUBERTUS, STREEFKERK BOB, SIMON KLAUS, LOOPSTRA ERIK ROELOF, KOLESNYCHENKO ALEKSEY, DE SMIT JOANNES THEODOOR, DERKSEN ANTONIUS THEODORUS ANNA MARIA, LOF JOERI
Format Patent
LanguageEnglish
Published 17.12.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
Bibliography:Application Number: US201514743775